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Characteristics of argon-chlorine inductively coupled plasmas for plasma surface modification and etching.

by Osmund A. Okpalugo

Publisher: The author] in [S.l

Written in English
Published: Downloads: 339
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Edition Notes

Thesis (Ph. D.) - University of Ulster, 2003.

ID Numbers
Open LibraryOL15949515M
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Characteristics of argon-chlorine inductively coupled plasmas for plasma surface modification and etching. by Osmund A. Okpalugo Download PDF EPUB FB2